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Manufacturing

  • ESD - Physics and Devices

    Electrostatic discharge (ESD) phenomena have been known to mankind since Thales of Miletus in approximately 600 B.C.E. noticed the attraction of strands of hay to amber. Two thousand six hundred years have passed and the quest to obtain a better under- standing of electrostatics and ESD phenomenon continues. Today, the Manufacturing of microelectronics has continued the interest in the field of electrostatic phenomenon spanning factory issues, tooling, materials, and the microelectronic industry

    标签: Devices Physics ESD and

    上传时间: 2020-06-05

    上传用户:shancjb

  • ESD Program Management

    Electrostatic discharge  (ESD)  events  can  have serious detrimental effects  on  the manufacture  and  performance of microelectronic devices, the systems that contain them,  and  the Manufacturing facilities used  to produce them. Submicron device technologies, high system operating speeds,  and  factory automation are making  ESD  control programs a critical factor  in  the quality  and  reliability of ESD-sensitive products.

    标签: Management Program ESD

    上传时间: 2020-06-05

    上传用户:shancjb

  • ESD+Basics

    This text, ESD Basics: From Semiconductor Manufacturing to Product Use was initiated on the need to produce a text that addresses fundamentals of electrostatic discharge from the Manufacturing environment to today’s products. As the Manufacturing world evolves, semi- conductor networks scale, and systems are changing, the needs and requirements for reliabi- lity and ESD protection are changing. A text is required that connects basic ESD phenomena to today’s real world environment.

    标签: Basics ESD

    上传时间: 2020-06-05

    上传用户:shancjb

  • Chemical mechanical polishing

    The planarization technology of Chemical-Mechanical-Polishing (CMP), used for the Manufacturing of multi- level metal interconnects for high-density Integrated Circuits (IC), is also readily adaptable as an enabling technology in MicroElectroMechanical Systems (MEMS) fabrication, particularly polysilicon surface micromachining. CMP not only eases the design and manufacturability of MEMS devices by eliminating several photolithographic and film issues generated by severe topography, but also enables far greater flexibility with process complexity and associated designs. T

    标签: mechanical polishing Chemical

    上传时间: 2020-06-06

    上传用户:shancjb

  • Modern_Control_Theory

    The main aim of this book is to present a unified, systematic description of basic and advanced problems, methods and algorithms of the modern con- trol theory considered as a foundation for the design of computer control and management systems. The scope of the book differs considerably from the topics of classical traditional control theory mainly oriented to the needs of automatic control of technical devices and technological proc- esses. Taking into account a variety of new applications, the book presents a compact and uniform description containing traditional analysis and op- timization problems for control systems as well as control problems with non-probabilistic models of uncertainty, problems of learning, intelligent, knowledge-based and operation systems – important for applications in the control of Manufacturing processes, in the project management and in the control of computer systems.

    标签: Modern_Control_Theory

    上传时间: 2020-06-10

    上传用户:shancjb

  • Design for Manufacturability and Statistical

    Design for manufacturability and statistical design encompass a number of activities and areas of study spanning the integrated circuit design and Manufacturing worlds. In the early days of the planar integrated circuit, it was typical for a handful of practitioners working on a particular design to have a fairly complete understanding of the Manufacturing process, the resulting semiconductor active and passive devices, as well as the resulting circuit - often composed of as few as tens of devices. With the success of semiconductor scaling, predicted and - to a certain extent even driven - by Moore’s law, and the vastly increased complexity of modern nano-meter scale processes and the billion-device circuits they allow, there came a necessary separation between the various disciplines.

    标签: Manufacturability Statistical Design for and

    上传时间: 2020-06-10

    上传用户:shancjb

  • Fundamentals of Semiconductor Manufacturing And Process Control

    半导体生产和过程控制的基础  这是一本系统介绍芯片生产工艺基础的好书,叙事严谨,条理清晰,值得一看

    标签: 芯片生产工艺

    上传时间: 2021-11-03

    上传用户:

  • VIP专区-嵌入式/单片机编程源码精选合集系列(133)

    VIP专区-嵌入式/单片机编程源码精选合集系列(133)资源包含以下内容:1. 一款优秀的51系统读写U盘的源程序和原理图.2. Automating Manufacturing Systems with PLCs 一本关于plc的理论书籍,解析很详细.3. 基于ATmega128的无线通信节点程序.4. wince 串口通讯非常好的源代码.5. Cypress 的(鼠标+键盘)复合设备汇编源程序.6. S3C44B0X开发板上的蜂鸣器测试程序.7. MCP2515使用的一个例子,有原理图和原代码.很使用..8. 步进电机的C++控制 很好用 适合初学者参考.9. 基于无线网络zigbee的协议栈的c代码。.10. 该文档介绍了如何用ti的cc2420来实现zigbee无线传感网络。.11. NPI单片机C语言编写的EEPROM读写程序,单片机为AT89C51ED2..12. IP04是一个使用Blackfin开源硬件结合Asterisk开源软件建立的IPPBX系统..13. 西安傅立叶科技的三星ARMS3C2410开发板电路的原理图.14. 磁盘FAT扇区数据读写操作 Ver 1.20(更新版).15. ATMEL 90usb128 USB CDC source,include USB protocol stack..16. (1)利用单片机定时器中断和定时器计数方式实现秒、分定时。 (2)通过LED显示程序的调整.17. 可实现时钟功能,倒计时,秒表,可以修改时间,蜂鸣器报警等.18. 带 SPI接口的独立 以太网控制器 . 2006 Microchip Technology Inc.高级信息 DS39662A_CN.19. 本文研究了在目前流行的嵌入式微控制器ARM9(Samsung 的 S3C2410)上硬件测试的方法。分析了在嵌入式Linux基础上开发测试程序的基本方法.20. 基于ARM2200开发平台开发的嵌入式TCPIP协议栈.21. Nucleus集成开发环境测试版.22. 软件无线电USRP v4.2版本硬件原理图.23. 嵌入式usb硬件开发.24. 基于QtEmbedded的GUI移植及应用程序开发.25. 最流行的CPLD.26. verilog语言编写的多处理器的程序代码.27. Flash file system.28. 本设计应用AT89C52单片机对高亮度LED显示屏进行控制.29. 最近做的工程需要用到步进电机,但由于量小,又没有厂家的选型手册,只得托人从深圳随便发了几个…… NMB (PM35L-048-HPH7)据我的测试.30. 运行ambfn7.m函数.31. 《PIC单片机应用开发典型模块》源代码及图片.32. 嵌入式开发的资料.33. 这是一个在某开发板上的FLASH文件系统的源码.34. STC12C5404AD的串口程序.35. E2ROM的读写程序.36. DS1302+AT89S52+LED的时钟显示.37. 电子时钟芯片ds1302的c51的程序例子.38. 用AT89C51和DS1302一起做的万年历.39. 简单的在ATMEGA64上移植ucosII.40. 用硬件描述语言(或混合原理图)设计模24计数器模块、4-7显示译码模块、顶层模块。.

    标签: 智能卡技术

    上传时间: 2013-06-24

    上传用户:eeworm